Ion plating is what

Ion plating is what

Ion plating processing including sputtering deposition and ion plating in two ways. Ion sputtering coating is a kind of coating method based on ion sputtering effect, applicable to the alloy membrane and compound membrane plating system. Splash control sputtering coating machine
  Ion plating is in vacuum evaporation coating and sputtering coating developed on the basis of a new technology of film coating, will all kinds of gas discharge mode is introduced into the field of vapor deposition, the vapor deposition process is carried out in the plasma. Particle energy ion plating has greatly increased the membrane layer, can obtain more excellent performance of membrane layer, expanded the application field of "thin film". Is a fast-growing, popular with people of the new technology.
  Ion plating is characterized by: coating, artifacts (substrate) with negative bias, the artifact is always affected by high-energy ion bombardment. Good form membrane layer of film adhesion, good film layer winding plating, membrane organization more controllable parameters, membrane layer overall high energy particles, easier for deposition reaction, can get compound membrane layer at lower temperatures.