CVD RF vacuum coating equipment

 

 Operational principle:
This equipment adopts RF frequency technology to make mixed gas and substrate interaction in a certain temperature and vacuum conditions. It formed metal and compound membrane in the substrate surface, the substrate surface have wear resistance, oxidation resistance, corrosion resistance, specific electrical, optical and friction performance and other special requirements. The equipment is applied in glass, ceramics, semiconductors, metals industry etc. It can form all kinds of metal film, alloy plating film, reaction of compound film, dielectric film and so on.
Main feature:
1. traditional vertical or high-efficient horizontal , using high-performance RF power supply
2. Equipped with many of magnetic control target, various of target material .
3. The substrate temperature about 600 ℃, plasma assisted.
4. The system adopts oil-free vacuum system, to ensure the whole system work under the oil-free condition to make the film clean;
5. The vacuum system interlock protection, vacuum pump have alarm function when water shortage, power outage;
6. Touch screen and PLC automatic control, realize parametric settings to the main components , real-time monitoring and intelligent fault diagnosis.
Basic outfit:
 1. Chamber structure: vertical or horizontal structure ,all stainless steel material , the vacuum chamber effective diameter of 800mm-2000mm, water-cooled double sandwich structure, inside stainless steel plate with a plug-in anti-fouling, easy to clean and operation;
2. The work-piece frame: common monolithic or umbrella structure, or customized according to customer requirements, adopts inverter to adjust, and speed stepless  adjustable;
3. Vacuum systems: mechanical pump, vane pump, roots pump, molecular pump, cryogenic pump, high vacuum oil diffusion pump with cold trap .the pre-pump for oil-free vacuum pumps with stainless steel pipes and valves;
4. Vacuum assisted pump system, equipped with a rapid circulation of low temperature steam trap;
5. Pneumatic system: automatic gas meter and flow display control;
6. Control system: color touch screen, PLC, automatic and manual control convertible. Real-time display detailed parameters, automatic control the entire production process, automatic storage process parameters. The main electric elements adopt Schneider, Siemens and other famous brands;
7. Security system: water, electricity, gas abnormal sound and light alarm device, and perform the corresponding protection;
8. Heating and baking system: stainless steel tubular heating element, substrate temperature up to 350 degrees, the temperature control using the Japanese conductivity meter, temperature control accuracy of ± 1 ° C;
9. film thickness control: quartz crystal thickness monitoring system can control the electron gun evaporation rate, precise control of film thickness, manual and automatic easy switching.